The 11th International Symposium on SIMS in Japan

The International Symposium on SIMS
and Related Techniques Based on Ion-Solid Interactions
at Seikei University, Japan

SISS-11
|
Scope
Date
Place
Program
Abstract Fee
Contact us
Committee

Ｔhe past SIMS symposiums in Japan

SIMS workshop (USA)

The International Symposium on SIMS and Related Techniques
Based on Ion-Solid Interactions at Seikei University (SISS-11)


Scope:	The SISS-11 was a success with 140 people participants in two days. We would like to express our thanks for the kind attention on the symposium. We look forward to continuing to stay in touch with you for the symposium at SISS-12 in next year.

Date:	June 11-12, 2009 10:00-17:00

Place:	Meeting Room on the 4th floor, University Building #14, Seikei University (Social meeting: June 11, 2009 17:20-19:00, Hall on the 12th floor, University Building #10)
	Access to Seikei University in Tokyo ACCOMMODATION (Recommended Hotels)
Program:	Program June 11, 2009 (Thu.) 10:00- Opening remarks 10:05-12:05 [[ TOF-SIMS session - New methods ]] 1. " Development of Mass Microscopy " (20 min.) T.Hayasaka and M.Setou, Hamamatsu Univ. School of Medicine 2. " A Stigmatic Mass Microscope using Multi-turn Time-of-flight Mass Spectrometer " (20 min.) H.Hazama, Graduate School of Engineering, Osaka Univ. 3. " Development of Electrospray Droplet Impact/SIMS " (20 min.) D.Asakawa and K.Hiraoka, Clean Energy Research Center, Univ. of Yamanashi 4. " TOF-SIMS and Depth Profile Analysis of Organic Films with Ar Cluster Ion Beams " (20 min.) S.Ninomiya, Quantum Science and Engineering Center, Kyoto Univ. 5* " TOF-SIMS for Cardiovascular Researches " (40 min.) D.W.Moon, Korea Research Institute of Standards and Science (KRISS) (12:05-13:05 Lunch) 13:05-14:45 [[ TOF-SIMS session - Applications ]] 6. " Organic Depth Profiling by Cluster Ion Sputter " (20 min.) Y.Abe, Mitsubishi Chemical Gr. Science and Technology Research Center, Inc. 7. " Depth Profiling of Organic Thin Film by using TOF-SIMS with the Gradient Shaving Preparation " (20 min.) N.Man, Toray Research Center Inc. 8. " A Dedicated Field Emission Ion Source for G-SIMS Applications " (20 min.) D.Rading, F.Kollmer, R.Moellers, E.Niehuis, ION-TOF GmbH 9. " Investigation of Protein-immobilized Surface with TOF-SIMS and G-SIMS " (20 min.) S.Aoyagi, Faculty of Life and Environmental Science, Shimane Univ. 10. " Applications of an Automated Benchtop ToF-SIMS Instrument for Static, Imaging and Dynamic SIMS Analysis " (20 min.) M. Yanagi, J.Eccles, Millbrook Instruments Limited (14:45-15:00 coffee break) 15:00-16:20 [[ TOF-SIMS - Maker session ]] 1. " TOF-SIMS Applications and New Developments at ULVAC-PHI " (40 min.) S.Iida, N.Sanada, G.L.Fisher, S.R.Bryan, and M.Suzuki, ULVAC-PHI Inc. 2. " TOF-SIMS and High-Sensitivity LEIS: Complementary Techniques for Sensitive Surface Analysis " (40 min.) M.Terhorst, ION-TOF GmbH 16:20-17:25 [[ Poster session ]] (at Hall on the 12th floor, University Building #10) 1. "Matrix-free detection of protein molecules by gas cluster SIMS" S. Oshima, University of Hyogo 2. "Surface sensitive analysis of organic films using size-selected Ar gas cluster SIMS" M. Tanaka, University of Hyogo 3. "Fragmentation Analysis of PS polymer in GCIB SIMS by QMD method using the polymer model" K. Endo, Tokyo University of Science 4. "Theoretical mass spectrometry of PE, PP, PS, and PET polymers by MO and QMD methods using the polymer models" K. Endo, Tokyo University of Science 5. "Analysis of Self-healing Function of Chromate Coatings on Zinc Plate by TOF-SIMS" K. Tokuda and K. Miyashita, Gunma Industrial Technology Cent. 6. "Influences of water on photoresist surface in the immersion lithography technology" M.Sado, Sumika Chemical Analysis Service, LTD. 7. "Development of Non-Resonant Multi Photoionization SNMS with Nd:YAG Microchip Laser" N. Kubota, Nippon Steel Co. 8. "Optimization of Charge-Compensation in TOF-SIMS Analysis using Low-Energy Pulsed Electron Beam" K.Ohishi, Kougakuin University 9. "Image Analysis of Suspended Particulate Matters for Individual Particle Analysis using TOF-SIMS" H. Wada, Kougakuin University 10. "SIMS depth profile analysis of sodiumin silicon oxide" Y.Yamamoto, Asahi Glass Co., LTD. 11. "Analysis of oxygen self-diffusion in oxide ceramics" I. Sakaguchi, National Institute for Materials Science (NIMS) 12. "Atom Probe Evaluation of Platinum Distribution at NiPtSi/Si-substrate Interface" T.Sasaki, Toshiba Nanoanalysis Co. 17:25- Social meeting (at Hall on the 12th floor, University Building #10) ----------------------------------- June 12, 2009 (Fri.) 10:00-12:00 [[ Dynamic SIMS session ]] 1. " Improvement of SIMS Depth Resolution for Multiple W/Si Layer Analysis " (20 min.) M.Takahashi, Y.Hori and M.Tomita, Toshiba Nanoanalysis Corp., and Toshiba Corp. 2. " Developemnt of FIB-EB-TOF-SIMS for The Environmental Particle Analysis " (20 min.) S.Hayashi, N.Kubota, N.Tsuji, K.Mizuno, T.Sakamoto, S.Kashiwakura, and T.Nagasaka. Nippon Steel Corp., Nippon Steel Technoresearch, Kogakuin Univ., and Tohoku Univ. 3. " Development of Isotope Microscope and The Application to Cosmochemistry " (20 min.) H.Yurimoto, Department of Natural History Sciences, Hokkaido Univ. (11:00-11:20 coffee break) 4* " Ultra-shallow SIMS Depth Profiling " (40 min.) A.T.S.Wee, Department of Physics, National Univ. of Singapore [[ Dynamic-SIMS - Maker session ]] 1. " Recent Instrumental Developments and Applications on CAMECA Dynamic SIMS " (40 min.) S.Chou, AMETEK Inc. (Cameca Instruments) (12:40-13:40 Lunch) 13:40-16:50 [[ Atom Probe session ]] 1. "Development of Laser-Assisted Wide Angle Three-Dimensional Atom Probe for Analysis of Real Electronic Devices " (30 min.) N.Mayama, Institute of Industrial Science, Univ. of Tokyo 2. "Investigation of Impurity Distribution in NiSi/Si Schottky Junction Using Laser-assisted Three-dimensional Atom Probe " (30 min.) T.Kinnno, Toshiba Corp. R&D Cent. 3. " 3D Atom Probe Characterization of Nano-scale Microstructures in Metallic Materials " (30 min.) S.Hirosawa, Department of Mechanical Engineering and Materials Science, Yokohama National Univ. (15:10-15:30 coffee break) 15:30-16:50 [[ Atom Probe - Maker session ]] 1. " 3D Tomographic Atom Probe for Nano-scale Materials Analysis " (40 min.) S.Chou, AMETEK Inc. (Cameca Instruments) 2. " Multi-Dimensional Atom Probe Tomography Analysis of Semiconductor Materials " (40 min.) P.H.Clifton, Imago Scientific Instruments Corp. 16:50- Closing remarks
Download
Abstract Submission:	All invited and contributed presenters are expected to write abstract paper. Digital file (MS-Word file) should be sent by e-mail to the committee (Manabu Komatsu), no later than June 5th, 2009 (Extended!!). The abstract should be accompanied by a cover letter stating the title, name, address, e-mail address. The format requires A4 page (No page limitation).

Registration Fee:	2,000 Yen (including social meeting fee)

Contact us:	Organizing Committee Dr. Manabu Komatsu (Canon) E-mail to (Please replace ''*' to '@' in the address.)

Committee:

*Organizing Committee*
Chair: Masahiro Kudo	Seikei University
Manabu Komatsu	Canon
Program Coordinators
Atsushi Murase	Toyota Central R&D Labs.
Mitsuhiro Tomita	Toshiba
Akio Takano	NTT-AT
Masashi Nojima	Tokyo University of Science
Teiichiro Kono	Asahi Kasei
*Technical Advisor*
Teiichiro Kono	Asahi Kasei
Nobuhiko Kato	Seikei University
*Finance & Editorial Coordinators*
Mitsuhiro Tomita	Toshiba

　